Application Notes

ENERGICO

• Predicting Emissions with Auto-generated Equivalent Reactor Networks
• Assessing Lean Blow Off Using ENERGICO

CHEMKIN-CFD for FLUENT

• Improved Modeling of Multi-step Reaction Kinetics with CHEMKIN-CFD for FLUENT

CHEMKIN-PRO

Automotive

• CHEMKIN-PRO for Reciprocating Engine Applications
• Single Zone Homogeneous Charge Compression Ignition (HCCI) Engine
• Engine Exhaust Aftertreatment with a Transient Inlet Flow
• Verifying Ignition Delay Predictions of a Detailed Kinetics Mechanism
• Laminar Flame Speed of Stoichiometric Methane/Air Premixed Flame
• Modeling HCCI Engine with Exhaust Gas Recirculation

Particle Tracking

• Modeling Soot Production

Flame Calculations

• Burner-stabilized Flame
• Jet Flame Analysis with an Equivalent Reactor Network
• Co-Flow, Non-Premixed Methane/Air Flame

Advanced Analyses

• Reaction Path Analysis
• Uncertainty Analysis
• Multi-Zone Engine Model
• Parameter Study Facility for Surface Chemistry Analysis
• Using the Parameter-Study Facility to Vary Equivalence Ratio in Flame-speed Calculations
• Using the Partially Stirred Reactor to Assess Turbulence-Kinetics Interactions in a Combustor

CHEMKIN

Materials and Microelectronics with CHEMKIN

• Using CHEMKIN 4.1 for Materials and Microelectronics Applications
• Equilibrium Analysis of Chlorosilane Chemical Vapor Deposition (CVD)
• PSR Analysis of Steady-State Thermal Chemical Vapor Deposition (CVD)
• Approximations for a Cylindrical Flow Chemical Vapor Deposition (CVD) Reactor
• Deposition in a Rotating Disk Chemical Vapor Deposition (CVD) Reactor
• Trichlorosilane Chemical Vapor Deposition (CVD) in a Planar Channel Flow Reactor
• Steady-State Chlorine Plasma
• Spacial Chlorine Plasma Plug-flow Reactor (PFR) with Power Profile
• Fluorocarbon Plasma Etching of Silicon Dioxide
• Time-Dependent Simulations of the Atomic Layer Deposition (ALD) Process