Application Notes

Reaction Design provides application features tailored for your industry needs. Below is a list of currently available application notes for FORTE, ENERGICO, CHEMKIN-CFD for FLUENT, CHEMKIN-PRO and CHEMKIN. All application notes are PDF format ().

FORTÉ

ENERGICO

CHEMKIN-CFD for FLUENT

Improved Modeling of Multi-step Reaction Kinetics with CHEMKIN-CFD for FLUENT

	CHEMKIN	CHEMKIN-PRO
AUTOMOTIVE
CHEMKIN-PRO for Reciprocating Engine Applications		X
Single Zone Homogeneous Charge Compression Ignition (HCCI) Engine	X	X
Engine Exhaust Aftertreatment with a Transient Inlet Flow	X	X
Verifying Ignition Delay Predictions of a Detailed Kinetics Mechanism	X	X
Laminar Flame Speed of Stoichiometric Methane/Air Premixed Flame	X	X
Modeling HCCI Engine with Exhaust Gas Recirculation		X
PARTICLE TRACKING
Modeling Soot Production		X
FLAME CALCULATIONS
Flame-Extinction Strain Rate Simulations		X
Burner-stabilized Flame	X	X
Jet Flame Analysis with an Equivalent Reactor Network	X	X
Co-Flow Non-Premixed Methane/Air Flame	X	X
ADVANCED ANALYSES
Reaction Path Analysis		X
Uncertainty Analysis		X
Multi-Zone Engine Model		X
Parameter Study Facility for Surface Chemistry Analysis	X	X
Using the Parameter-Study Facility to Vary Equivalence Ratio in Flame-speed Calculations	X	X
Using Partially Stirred Reactor to Assess Turbulence-Kinetics Interactions in a Combustor	X	X
MATERIALS and MICROELECTRONICS
Using CHEMKIN for Materials and Microelectronics Applications	X	X
Equilibrium Analysis of Chlorosilane Chemical Vapor Deposition (CVD)	X	X
PSR Analysis of Steady-State Thermal Chemical Vapor Deposition (CVD)	X	X
Approximations for a Cylindrical Flow Chemical Vapor Deposition (CVD) Reactor	X	X
Deposition in a Rotating Disk Chemical Vapor Deposition (CVD) Reactor	X	X
Trichlorosilane Chemical Vapor Deposition (CVD) in a Planar Channel Flow Reactor	X	X
Steady-State Chlorine Plasma	X	X
Spatial Chlorine Plasma Plug-flow Reactor (PFR) with Power Profile	X	X
Fluorocarbon Plasma Etching of Silicon Dioxide	X	X
Time-Dependent Simulations of the Atomic Layer Deposition (ALD) Process	X	X

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