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Application Notes

Reaction Design provides application features tailored for your industry needs. Below is a list of currently available application notes for FORTE, ENERGICO, CHEMKIN-CFD for FLUENT, CHEMKIN-PRO and CHEMKIN. All application notes are PDF format (PDF icon).

FORTÉ

ENERGICO

CHEMKIN-CFD for FLUENT

 

 
CHEMKIN
CHEMKIN-PRO
AUTOMOTIVE
CHEMKIN-PRO for Reciprocating Engine Applications

     

X
Single Zone Homogeneous Charge Compression Ignition (HCCI) Engine
X
X
Engine Exhaust Aftertreatment with a Transient Inlet Flow
X
X
Verifying Ignition Delay Predictions of a Detailed Kinetics Mechanism
X
X
Laminar Flame Speed of Stoichiometric Methane/Air Premixed Flame
X
X
Modeling HCCI Engine with Exhaust Gas Recirculation  
X
PARTICLE TRACKING
Modeling Soot Production  
X
FLAME CALCULATIONS
Flame-Extinction Strain Rate Simulations  
X
Burner-stabilized Flame
X
X
Jet Flame Analysis with an Equivalent Reactor Network
X
X
Co-Flow Non-Premixed Methane/Air Flame
X
X
ADVANCED ANALYSES
Reaction Path Analysis  
X
Uncertainty Analysis  
X
Multi-Zone Engine Model  
X
Parameter Study Facility for Surface Chemistry Analysis
X
X
Using the Parameter-Study Facility to Vary Equivalence Ratio in Flame-speed Calculations
X
X
Using Partially Stirred Reactor to Assess Turbulence-Kinetics Interactions in a Combustor
X
X
MATERIALS and MICROELECTRONICS
Using CHEMKIN for Materials and Microelectronics Applications
X
X
Equilibrium Analysis of Chlorosilane Chemical Vapor Deposition (CVD)
X
X
PSR Analysis of Steady-State Thermal Chemical Vapor Deposition (CVD)
X
X
Approximations for a Cylindrical Flow Chemical Vapor Deposition (CVD) Reactor
X
X
Deposition in a Rotating Disk Chemical Vapor Deposition (CVD) Reactor
X
X
Trichlorosilane Chemical Vapor Deposition (CVD) in a Planar Channel Flow Reactor
X
X
Steady-State Chlorine Plasma
X
X
Spatial Chlorine Plasma Plug-flow Reactor (PFR) with Power Profile
X
X
Fluorocarbon Plasma Etching of Silicon Dioxide
X
X
Time-Dependent Simulations of the Atomic Layer Deposition (ALD) Process
X
X

 

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